[S-I-2-2] Selective Boron Atomic-Layer Doping of Silicon Using an HBO2 Source and a Thin Oxide Mask

Eiichi MURAKAMI、Hiroshi KUJIRAI、Shin'ichiro KIMURA (1.Central Research Laboratory, Hitachi, Ltd.)

https://doi.org/10.7567/SSDM.1993.S-I-2-2