Characterization of Interface Roughness in Ge/SiGe Heterostructures Using Photoreflectance Spectroscopy

Hiroyuki YAGUCHI; Kaori TAI; Keizo TAKEMASA; Kentaro ONABE; Yasuhiro SHIRAKI; Ryoichi ITO

doi:https://doi.org/10.7567/SSDM.1993.S-I-6-6

[S-I-6-6] Characterization of Interface Roughness in Ge/SiGe Heterostructures Using Photoreflectance Spectroscopy

Hiroyuki YAGUCHI, Kaori TAI, Keizo TAKEMASA, Kentaro ONABE, Yasuhiro SHIRAKI, Ryoichi ITO (1.Department of Applied Physics, The University of Tokyo, 2.Research Center for Advanced Science and Technology (RCAST), The University of Tokyo)

https://doi.org/10.7567/SSDM.1993.S-I-6-6

1993 International Conference on Solid State Devices and Materials

[S-I-6-6] Characterization of Interface Roughness in Ge/SiGe Heterostructures Using Photoreflectance Spectroscopy