[S-I-8-5] Growth of Epitaxial Si/CoSi2/Si and Si/FeSi2/Si Heterostructures by MBE and Annealing

S. Mantl、O. Skeide、I. Michel、H. L. Bay、S. Mesters (1.Institut fur Schicht- und Ionentechnik, Forschungszentrum)

https://doi.org/10.7567/SSDM.1993.S-I-8-5