Quarter-Micron Contact Filling by Ionized Beam Deposition

Hiroki ITO; Naoyuki KAJITA; Masahiro HANAI; Yoichi HASHIMOTO; Nobuo TANAKA; Hisao YOSHIDA

doi:https://doi.org/10.7567/SSDM.1993.S-II-13

1993 International Conference on Solid State Devices and Materials

1993年8月29日〜 1993年9月1日
Makuhari Messe, Chiba, Japan

[S-II-13] Quarter-Micron Contact Filling by Ionized Beam Deposition

Hiroki ITO、Naoyuki KAJITA、Masahiro HANAI、Yoichi HASHIMOTO、Nobuo TANAKA、Hisao YOSHIDA (1.Itami Works, Manufacturing Development Lab, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1993.S-II-13

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