[S-II-15] Analysis of Ti Self-Passivation on Silver Interconnects for ULSIs Applications

T. Iijima, H. Ono, N. Ninomiya, Y. Ushiku, T. Hatanaka, A. Nishiyama, H. Iwai (1.ULSI Laboratories, Environmental Engineering Laboratories, Research and Development Center, Toshiba Corporation)

https://doi.org/10.7567/SSDM.1993.S-II-15