[S-II-15] Analysis of Ti Self-Passivation on Silver Interconnects for ULSIs Applications

T. Iijima、H. Ono、N. Ninomiya、Y. Ushiku、T. Hatanaka、A. Nishiyama、H. Iwai (1.ULSI Laboratories, Environmental Engineering Laboratories, Research and Development Center, Toshiba Corporation)

https://doi.org/10.7567/SSDM.1993.S-II-15