Selective Etching of Native Oxide Using Vapor HF Processing

J. M. de Larios; J. O. Borland; S. Hatada; I. Tamatani

doi:https://doi.org/10.7567/SSDM.1993.S-II-2

1993 International Conference on Solid State Devices and Materials

Aug 29, 1993 - Sep 1, 1993
Makuhari Messe, Chiba, Japan

[S-II-2] Selective Etching of Native Oxide Using Vapor HF Processing

J. M. de Larios, J. O. Borland, S. Hatada, I. Tamatani (1.Genus, Inc., Thin Film Division, 2.Sumitomo Metal Industries, Ltd., Semiconductor Equipment Div.)

https://doi.org/10.7567/SSDM.1993.S-II-2

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