Selective Etching of Native Oxide Using Vapor HF Processing

J. M. de Larios; J. O. Borland; S. Hatada; I. Tamatani

doi:https://doi.org/10.7567/SSDM.1993.S-II-2

1993 International Conference on Solid State Devices and Materials

1993年8月29日〜 1993年9月1日
Makuhari Messe, Chiba, Japan

[S-II-2] Selective Etching of Native Oxide Using Vapor HF Processing

J. M. de Larios、J. O. Borland、S. Hatada、I. Tamatani (1.Genus, Inc., Thin Film Division、2.Sumitomo Metal Industries, Ltd., Semiconductor Equipment Div.)

https://doi.org/10.7567/SSDM.1993.S-II-2

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