[S-II-6] New Self-Developing X-ray Resists Consisting of Polysilanes

Atsuko Yamaguchi, Taro Ogawa, Takashi Soga, Hiroaki Tachibana, Mutsuyoshi Matsumoto, Hiroaki Oizumi, Eiji Takeda (1.Central Research Laboratory, Hitachi Ltd., 2.National Institute of Materials and Chemical Research, 3.SORTEC Corp.)

https://doi.org/10.7567/SSDM.1993.S-II-6