[S-II-6] New Self-Developing X-ray Resists Consisting of Polysilanes

Atsuko Yamaguchi、Taro Ogawa、Takashi Soga、Hiroaki Tachibana、Mutsuyoshi Matsumoto、Hiroaki Oizumi、Eiji Takeda (1.Central Research Laboratory, Hitachi Ltd.、2.National Institute of Materials and Chemical Research、3.SORTEC Corp.)

https://doi.org/10.7567/SSDM.1993.S-II-6