[S-III-3] Layer-by-Layer Etching of Si by Self-Limited Adsorption of Chlorine with Alternated Irradiation of Low Energy Ar+ Ions

Takashi MATSUURA, Junichi MUROTA, Yasuji SAWADA, Tadahiro OHMI (1.Laboratory for Microelectronics, Research Institute of Electrical Communication, Department of Electronic Engineering, Faculty of Engineering, Tohoku University)

https://doi.org/10.7567/SSDM.1993.S-III-3