[S-III-9] Native Oxides on Si-Surfaces of Deep-Submicron Contact-Hole-Bottoms

N. Aoto、M. Nakamori、H. Hada、T. Kunio、E. Ikawa (1.ULSI Device Development Laboratories, Microelectronics Research Laboratories NEC Corporation)

https://doi.org/10.7567/SSDM.1993.S-III-9