[S-IV-8] Oxygen Enhanced Dissociation Effect on MOCVD PZT Thin Film

Shigeo Ohnishi, Masaya Komai, Kazuya Ishihara, Keizo Sakiyama Masaru Shimizu, Tadashi Shiosaki (1.VLSI Development Laboratory, IC-Group, SHARP Corp., 2.Department of Electronics, Faculty of Engineering, Kyoto University)

https://doi.org/10.7567/SSDM.1993.S-IV-8