[A-1-4] The Importance of H2O2 Decomposition in Silicon Surface Cleaning

H. F. Schmidt、M. Meuris、P. W. Mertens、A. L. P. Rotondaro、M. M. Heyns、T. Q. Hurd、Z. Hatcher (1.IMEC、2.Texas Instruments、3.Ashland Chemical)

https://doi.org/10.7567/SSDM.1994.A-1-4