[A-1-4] The Importance of H2O2 Decomposition in Silicon Surface Cleaning

H. F. Schmidt, M. Meuris, P. W. Mertens, A. L. P. Rotondaro, M. M. Heyns, T. Q. Hurd, Z. Hatcher (1.IMEC, 2.Texas Instruments, 3.Ashland Chemical)

https://doi.org/10.7567/SSDM.1994.A-1-4