[A-11-2] Different Contribution of Interface States and Substrate Impurities to Coulomb Scattering in Si MOS Inversion Layer

Junji KOGA, Shin-ichi TAKAGI, Akira TORIUMI (1.ULSI Research Laboratories, TOSHIBA Corporation)

https://doi.org/10.7567/SSDM.1994.A-11-2