The Japan Society of Applied Physics

[A-2-2] Cleaning Technology and Analysis Technology for Hydrocarbon Contamination on Si Wafer Surface

Naomichi YONEKAWA, Sinichi YASUI, Tadahiro OHMI (1.Department of Electronics, Faculty of Engineering, Tohoku University)

https://doi.org/10.7567/SSDM.1994.A-2-2