[A-2-4] Quantum Chemical Investigation of Metal Adsorption Mechanism onto Silicon Surface in Cleaning Solution

Moriya MIYASHITA、Hiroyasu KUBOTA、Yoshiaki MATSUSHITA Reiko YOSHIMURA、Tsukasa TADA (1.Semiconductor Materials Engineering Dept., Toshiba Corporation、2.Research and Development Center, Toshiba Corporation)

https://doi.org/10.7567/SSDM.1994.A-2-4