[A-2-5] Effects of Dissolved Oxygen in HF Solution on Silicon Surface Morphology

Hiroki OGAWA、Kenji ISHIKAWA、Miki T. SUZUKI、Yuka HAYAMI、Shuzo FUJIMURA (1.Process Development Div. C850 FUJITSU Limited)

https://doi.org/10.7567/SSDM.1994.A-2-5