[A-2-5] Effects of Dissolved Oxygen in HF Solution on Silicon Surface Morphology

Hiroki OGAWA, Kenji ISHIKAWA, Miki T. SUZUKI, Yuka HAYAMI, Shuzo FUJIMURA (1.Process Development Div. C850 FUJITSU Limited)

https://doi.org/10.7567/SSDM.1994.A-2-5