Local Dielectric Breakdown of Thin Silicon Oxide by Dense Contact Electrification

Yoshinobu FUKANO; Takayuki UCHIHASHI; Takahiro OKUSAKO; Yasuhiro SUGAWARA; Yoshiki YAMANISHI; Takahiko OASA; Seizo MORITA

doi:https://doi.org/10.7567/SSDM.1994.A-5-1

[A-5-1] Local Dielectric Breakdown of Thin Silicon Oxide by Dense Contact Electrification

Yoshinobu FUKANO、Takayuki UCHIHASHI、Takahiro OKUSAKO、Yasuhiro SUGAWARA、Yoshiki YAMANISHI、Takahiko OASA、Seizo MORITA (1.Department of Physics, Faculty of Science, Hiroshima University、2.Advanced Technology Research Labs., Sumitomo Metal Industries, Ltd.)

https://doi.org/10.7567/SSDM.1994.A-5-1

1994 International Conference on Solid State Devices and Materials

[A-5-1] Local Dielectric Breakdown of Thin Silicon Oxide by Dense Contact Electrification