[A-6-3] Improved Pattern Profile Based on Analyzing between Substrate Surface and Chemically Amplified Resist

Shigeyasu MORI、Kouichirou ADACHI、Takashi SUGIHARA、Takashi FUKUSHIMA、Junkou TAKAGI (1.Central Research Laboratories, SHARP Corporation)

https://doi.org/10.7567/SSDM.1994.A-6-3