[A-7-2] High Temperature Etching of PZT/Pt/TiN Structure by High Density ECR Plasma

Seiichi YOKOYAMA、Yasuyuki ITO Kazuya ISHIHARA、Kazuyuki HAMADA、Shigeo OHNISHI、Jun KUDO、Keizo SAKIYAMA (1.VLSI Development Laboratories, Functional Devices Laboratories, SHARP Corporation)

https://doi.org/10.7567/SSDM.1994.A-7-2