Electromigration Resistance Measurements of Multilayered Interconnections by Short Test Lines

Shin-ichi Fukada; Masayoshi Hirasawa; Masayuki Suzuki

doi:https://doi.org/10.7567/SSDM.1994.C-10-1

1994 International Conference on Solid State Devices and Materials

1994年8月23日〜 1994年8月26日
Pacifico Yokohama, Yokohama, Japan

[C-10-1] Electromigration Resistance Measurements of Multilayered Interconnections by Short Test Lines

Shin-ichi Fukada、Masayoshi Hirasawa、Masayuki Suzuki (1.Hitachi Research Laboratory, Hitachi, Ltd.、2.Semiconductor and Integrated Circuit Division, Hitachi, Ltd.)

https://doi.org/10.7567/SSDM.1994.C-10-1

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