[C-10-1] Electromigration Resistance Measurements of Multilayered Interconnections by Short Test Lines

Shin-ichi Fukada, Masayoshi Hirasawa, Masayuki Suzuki (1.Hitachi Research Laboratory, Hitachi, Ltd., 2.Semiconductor and Integrated Circuit Division, Hitachi, Ltd.)

https://doi.org/10.7567/SSDM.1994.C-10-1