[C-12-5] Suppression of Al/W Reaction in Al/W Layered Interconnects by W Surface Treatment before Al Deposition

Yusuke Harada, Yuhki Itoh, Hiroshi Onoda (1.VLSI Research and Development Center, OKI Electric Industry Co., Ltd.)

https://doi.org/10.7567/SSDM.1994.C-12-5