[C-9-1] Relationship between Nitrogen Profile and Reliability of Heavily Oxynitrided Tunnel Oxide Films for Flash EEPROMs

T. Arakawa、T. Hayashi、M. Ohno、R. Matsumoto、A. Uchiyama、H. Fukuda (1.Semiconductor Technology Laboratory, LSI Process Technology Division Oki Electric Industry, Co., Ltd.)

https://doi.org/10.7567/SSDM.1994.C-9-1