[LD-12] Oxygen Precipitate Density Control in CZ-Si Wafers by Hydrogen Annealing Process

K. Izunome, H. Shirai, K. Kashima, J. Yoshikawa, A. Hojo (1.Toshiba Ceramics R&D Center, 2.Toshiba Ceramics Silicon Division)

https://doi.org/10.7567/SSDM.1994.LD-12