Very Low Temperature Deposition of Micro/Polycrystalline Si Films Made by Hydrogen Dilution with PE-CVD and ECR-CVD

K. C. Wang; Y. L. Jiang; T. R. Yew; H. L. Hwang

doi:https://doi.org/10.7567/SSDM.1994.PA-4-12

[PA-4-12] Very Low Temperature Deposition of Micro/Polycrystalline Si Films Made by Hydrogen Dilution with PE-CVD and ECR-CVD

K. C. Wang、Y. L. Jiang、T. R. Yew、H. L. Hwang (1.Dept. of Elec. Eng., National Tsing-Hua University、2.Dept. of Elec. Eng., National Chung-Hsing University、3.Materials Science Center, National Tsing-Hua University)

https://doi.org/10.7567/SSDM.1994.PA-4-12

1994 International Conference on Solid State Devices and Materials

[PA-4-12] Very Low Temperature Deposition of Micro/Polycrystalline Si Films Made by Hydrogen Dilution with PE-CVD and ECR-CVD