Very Low Temperature Deposition of Micro/Polycrystalline Si Films Made by Hydrogen Dilution with PE-CVD and ECR-CVD

K. C. Wang; Y. L. Jiang; T. R. Yew; H. L. Hwang

doi:https://doi.org/10.7567/SSDM.1994.PA-4-12

[PA-4-12] Very Low Temperature Deposition of Micro/Polycrystalline Si Films Made by Hydrogen Dilution with PE-CVD and ECR-CVD

K. C. Wang, Y. L. Jiang, T. R. Yew, H. L. Hwang (1.Dept. of Elec. Eng., National Tsing-Hua University, 2.Dept. of Elec. Eng., National Chung-Hsing University, 3.Materials Science Center, National Tsing-Hua University)

https://doi.org/10.7567/SSDM.1994.PA-4-12

1994 International Conference on Solid State Devices and Materials

[PA-4-12] Very Low Temperature Deposition of Micro/Polycrystalline Si Films Made by Hydrogen Dilution with PE-CVD and ECR-CVD