Characterization of P- and N-type Impurity Diffusions in GaAs from Doped Silica Films

Kazuya Okamoto; Atsushi Yamada; Yukihiro Shimogaki; Yoshiaki Nakano; Kunio Tada

doi:https://doi.org/10.7567/SSDM.1994.PB-2-3

[PB-2-3] Characterization of P- and N-type Impurity Diffusions in GaAs from Doped Silica Films

Kazuya Okamoto, Atsushi Yamada, Yukihiro Shimogaki, Yoshiaki Nakano, Kunio Tada (1.Central Research Laboratory, Nikon Corporation, 2.Faculty of Engineering, University of Tokyo)

https://doi.org/10.7567/SSDM.1994.PB-2-3

1994 International Conference on Solid State Devices and Materials

[PB-2-3] Characterization of P- and N-type Impurity Diffusions in GaAs from Doped Silica Films