Selective Aluminum Chemical Vapor Deposition Using DMEAA

S. C. Sun; M. H. Tsai; H. T. Chiu; S. Y. Yang

doi:https://doi.org/10.7567/SSDM.1994.PD-1-1

1994 International Conference on Solid State Devices and Materials

1994年8月23日〜 1994年8月26日
Pacifico Yokohama, Yokohama, Japan

[PD-1-1] Selective Aluminum Chemical Vapor Deposition Using DMEAA

S. C. Sun、M. H. Tsai、H. T. Chiu、S. Y. Yang (1.Department of Electronics Engineering & Institute of Electronics, National Nano Device Laboratory, Institute of Applied Chemistry Chiao Tung University)

https://doi.org/10.7567/SSDM.1994.PD-1-1

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