[PD-1-3] TiN/TiSi2 Formation Using TiNx Layer and Its Feasibilities in ULSI
Jeong Soo Byun、Chang Reol Kim、Kwan Goo Rha、Jae Jeong Kim、Woo Shik Kim
(1.Semiconductor Research Laboratory of GoldStar Electron Co. Ltd.)
https://doi.org/10.7567/SSDM.1994.PD-1-3
