The Japan Society of Applied Physics

[PD-1-3] TiN/TiSi2 Formation Using TiNx Layer and Its Feasibilities in ULSI

Jeong Soo Byun, Chang Reol Kim, Kwan Goo Rha, Jae Jeong Kim, Woo Shik Kim (1.Semiconductor Research Laboratory of GoldStar Electron Co. Ltd.)

https://doi.org/10.7567/SSDM.1994.PD-1-3