The Japan Society of Applied Physics

[PD-1-4] Low Energy Bias Sputtering Filling of SiO2 into High Aspect Ratio Trench Employing Axially Confined Helicon Wave Plasma

G. Sadakuni, Y. Kobayashi, H. Shindo, T. Fukazawa, H. Sakaue, S. Shingubara, Y. Horiike (1.Department of Electric and Electronic Engineering, Toyo University, 2.Department of Electrical Engineering, Hiroshima University and, 3.Department of Electrical Engineering, Fukuyama University)

https://doi.org/10.7567/SSDM.1994.PD-1-4