[PD-2-1] Ultra-Low-Temperature Growth of High-Integrity Thin Gate Oxide Films by Low-Energy Ion-Assisted Oxidation

Jinzo Watanabe、Yasuaki Kawai、Nobuhiro Konishi、Tadahiro Ohmi (1.Department of Electronics, Faculty of Engineering, Tohoku University)

https://doi.org/10.7567/SSDM.1994.PD-2-1