[PD-2-3] A Novel Approach for Leakage Current Reduction of LPCVD Ta2O5 Films by Rapid Thermal N2O Annealing

S. C. Sun、T. F. Chen (1.Department of Electronics Engineering & Institute of Electronics National Nano Device Laboratory, Chiao Tung University)

https://doi.org/10.7567/SSDM.1994.PD-2-3