Oxygen and Fluorine Treatment Effect on Silicon Surface Characterized by High-Sensitivity Infrared Reflection Spectroscopy

[PD-3-3] Oxygen and Fluorine Treatment Effect on Silicon Surface Characterized by High-Sensitivity Infrared Reflection Spectroscopy

Masanori OKUYAMA, Masahiro NISHIDA, Yoshihiro HAMAKAWA (1.Department of Electrical Engineering, Faculty of Engineering Science, Osaka University)