[PD-3-3] Oxygen and Fluorine Treatment Effect on Silicon Surface Characterized by High-Sensitivity Infrared Reflection Spectroscopy

Masanori OKUYAMA、Masahiro NISHIDA、Yoshihiro HAMAKAWA (1.Department of Electrical Engineering, Faculty of Engineering Science, Osaka University)

https://doi.org/10.7567/SSDM.1994.PD-3-3