[PD-4-2] Self-Align-Contact Etching with Inductive Coupled Plasma
Masayuki SATO, Takayuki TOHDA, Hiroyuki KAWANO, Daisuke TAKEHARA Nobuyuki TAKENAKA, Akira ISHIHAMA, Keizo SAKIYAMA
(1.VLSI Development Laboratories, IC-Group, SHARP Corporation)
https://doi.org/10.7567/SSDM.1994.PD-4-2