[PD-4-2] Self-Align-Contact Etching with Inductive Coupled Plasma

Masayuki SATO、Takayuki TOHDA、Hiroyuki KAWANO、Daisuke TAKEHARA Nobuyuki TAKENAKA、Akira ISHIHAMA、Keizo SAKIYAMA (1.VLSI Development Laboratories, IC-Group, SHARP Corporation)

https://doi.org/10.7567/SSDM.1994.PD-4-2