Self-Align-Contact Etching with Inductive Coupled Plasma

Masayuki SATO; Takayuki TOHDA; Hiroyuki KAWANO; Daisuke TAKEHARA Nobuyuki TAKENAKA; Akira ISHIHAMA; Keizo SAKIYAMA

doi:https://doi.org/10.7567/SSDM.1994.PD-4-2

1994 International Conference on Solid State Devices and Materials

Aug 23, 1994 - Aug 26, 1994
Pacifico Yokohama, Yokohama, Japan

[PD-4-2] Self-Align-Contact Etching with Inductive Coupled Plasma

Masayuki SATO, Takayuki TOHDA, Hiroyuki KAWANO, Daisuke TAKEHARA Nobuyuki TAKENAKA, Akira ISHIHAMA, Keizo SAKIYAMA (1.VLSI Development Laboratories, IC-Group, SHARP Corporation)

https://doi.org/10.7567/SSDM.1994.PD-4-2

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