A Novel LOCOS SPI (Self-Aligned-Pocket-Implantation) Technology for a Half Micron NMOSFET

C. J. KIM; H. W. JANG; Y. S. JANG; J. H. JIN; S. K. LIM; K. H CHOI

doi:https://doi.org/10.7567/SSDM.1994.PD-4-5

1994 International Conference on Solid State Devices and Materials

Aug 23, 1994 - Aug 26, 1994
Pacifico Yokohama, Yokohama, Japan

[PD-4-5] A Novel LOCOS SPI (Self-Aligned-Pocket-Implantation) Technology for a Half Micron NMOSFET

C. J. KIM, H. W. JANG, Y. S. JANG, J. H. JIN, S. K. LIM, K. H CHOI (1.SAMSUNG Electronics, Semiconductor R&D Center, Micro Process Development Buchun)

https://doi.org/10.7567/SSDM.1994.PD-4-5

▲