The Japan Society of Applied Physics

[PD-4-6] Abrupt and Arbitrary Profile Formation in Silicon Using a Low-Kinetic-Energy Ion Bombardment Process

Wataru SHINDO, Masaki HIRAYAMA, Tadahiro OHMI (1.Department of Electronic Engineering, Faculty of Engineering, Tohoku University)

https://doi.org/10.7567/SSDM.1994.PD-4-6