First Application of STM Nano-Meter Size Oxidation Process to Planar-Type MIM Diode

KAZUHIKO MATSUMOTO; Shu Takahashi; Masami Ishii; Masakatsu Hoshi; Akira Kurokawa; Shingo Ichimura; Atsushi Ando

doi:https://doi.org/10.7567/SSDM.1994.S-I-4-2

1994 International Conference on Solid State Devices and Materials

1994年8月23日〜 1994年8月26日
Pacifico Yokohama, Yokohama, Japan

[S-I-4-2] First Application of STM Nano-Meter Size Oxidation Process to Planar-Type MIM Diode

KAZUHIKO MATSUMOTO、Shu Takahashi、Masami Ishii、Masakatsu Hoshi、Akira Kurokawa、Shingo Ichimura、Atsushi Ando (1.Electrotechnical Laboratory MITI、2.Nissan Motor Co., LTD.)

https://doi.org/10.7567/SSDM.1994.S-I-4-2

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