The Japan Society of Applied Physics

[S-I-8-1] Electron-Beam Induced Etching as a Key Process in Through-Vacuum Fabrication of GaAs-AlGaAs Nanoheterostructures

Yoshifumi KATAYAMA、Tomonori ISHIKAWA、Nobuyuki TANAKA、Maximo LOPEZ、Isamu MATSUYAMA、Yuichi IDE、Masamichi YAMADA (1.Opotelectronics Technology Research Laboratory (OTL))

https://doi.org/10.7567/SSDM.1994.S-I-8-1