[S-I-8-2] EB Patterning Mechanism of GaAs Oxide Mask Layers Used in In-Situ EB Lithography

N. Tanaka、M. Lopez、I. Matsuyama、T. Ishikawa (1.Optoelectronics Technology Research Laboratory (OTL))

https://doi.org/10.7567/SSDM.1994.S-I-8-2