[PD-2-2] Selective Solid-Phase Crystallization of Amorphous Si by Oxygen Plasma Treatment

Yoshihiro OKADA, Katsuhide AOTO, Tanemasa ASANO (1.Center for Microelectronic Systems, Kyushu Institute of Technology)

https://doi.org/10.7567/SSDM.1996.PD-2-2