[A-1-2] Lateral Diffusion Distance Measurement for 40-80 nm Junctions by Etching/TEM-EELS Method

Y. Kunimune, N. Nishio, N. Kodama, H. Kikuchi, T. Toda, A. Mineji, S. Shishiguchi, S. Saito (1.ULSI Device Development Laboratories, NEC Corporation)

https://doi.org/10.7567/SSDM.1998.A-1-2