[A-1-2] Lateral Diffusion Distance Measurement for 40-80 nm Junctions by Etching/TEM-EELS Method

Y. Kunimune、N. Nishio、N. Kodama、H. Kikuchi、T. Toda、A. Mineji、S. Shishiguchi、S. Saito (1.ULSI Device Development Laboratories, NEC Corporation)

https://doi.org/10.7567/SSDM.1998.A-1-2